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P02100 - SEMI P21 - マスク描画装置の精度表示のガイドライン StdPbc-0221 This guideline may be improved

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Description

This guideline may be improved to be a specification after this effort

Floating Zone (FZ) method for single crystal silicon wafers

1  This Test Method provides a procedure for determining the nonvolatile trace inorganic impurities in bulk polymeric materials

SEMI F72 — Test Method for Auger Electron Spectroscopy (AES) Evaluation of Oxide Layer of Wetted Surfaces of Passivated 316L Stainless Steel Components

P02100 - SEMI P21 - マスク描画装置の精度表示のガイドライン StdPbc-0221 This guideline may be improvedNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI Global Micropatterning CommitteeJapanese Micropatterning Committee2003428Japanese Regional Standards Committee20036www. semi. org200371992 NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to

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